Thermal conductivity and thermoelectric power of heavily doped n-type silicon

Brinson, Mike and Dunstan, W. (1970) Thermal conductivity and thermoelectric power of heavily doped n-type silicon. Journal of Physics C: Solid State Physics, 3 (3). pp. 483-491. ISSN 0022-3719

Abstract

Experimental values are given of the thermal conductivity and thermoelectric power of n-type silicon doped with phosphorus, antimony or arsenic, containing 4*1019 to 6*1025 m-3 electrons at room temperature, covering the range 4-300 degrees K. A theoretical treatment, using the variational method, suggests that the ratio of phonon drag component of thermoelectric power to thermal conductivity should be independent of carrier concentration, if the latter is not too large. This is verified experimentally; the temperature variation of the ratio is in satisfactory agreement with theory, which also gives the correct order of magnitude for the absolute value.

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